Suwon-si, South Korea

Sukyoung Choi

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sukyoung Choi. Retrieved from https://idiyas.com/inventor/sukyoung-choi-x5eozeb3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Sukyoung Choi and Clothing Management Innovation.

Introduction

Sukyoung Choi is an inventor based in Suwon-si, South Korea, associated with Samsung Electronics Ltd. His patent work includes an apparatus designed to assess clothing contamination and recommend an appropriate management course.

Latest Patents

Choi is named on 1 patent: “Clothing Management Apparatus and Control Method Thereof.” The invention describes a clothing management apparatus with a reception space, an optical sensor, a door, a display, and a processor. The sensor emits ultraviolet light and detects reflected light. The processor uses the reflected-light intensity to identify an allergen value, estimates the clothing’s degree of contamination, and displays a recommended management course based on that assessment.

Career Highlights

Choi’s listed patent connects optical sensing and automated analysis to clothing care. By using an allergen-related measurement to guide recommendations, the apparatus is designed to provide users with information tailored to the condition of the clothes.

Collaborations

Sujin Seong and Byung-In Ma are identified as Choi’s coworkers. The available information does not specify their roles in the patent.

Conclusion

Sukyoung Choi’s patent presents a technology for assessing clothing conditions and recommending suitable care, reflecting an application of sensing and processing innovations to clothing management.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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