This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2007.
Company Filing History:
Years Active: 2007
Title: Sukesh Mohan: Innovator in Semiconductor Processing
Introduction
Sukesh Mohan is a prominent inventor based in Fremont, CA (US). He has made significant contributions to the field of semiconductor processing, particularly in improving etch efficiency through innovative methods and apparatus.
Latest Patents
Sukesh Mohan holds a patent for a "Method and apparatus employing integrated metrology for improved dielectric etch efficiency." This invention provides a method for processing semiconductor wafers to reduce dimensional variation. It involves feeding forward information related to photoresist mask critical dimension (CD) and profile, as well as underlying layer thickness, measured at several points on the wafer. This information is used to adjust subsequent processes, such as the etch process. After processing, dimensions of structures formed, like the CD and depth of trenches, are measured at multiple points on the wafer. This data is then fed back to the process tool to refine the process for the next wafer, further minimizing dimensional variation. The invention also emphasizes performing all transfer and processing steps in a clean environment to enhance yield by preventing contamination.
Career Highlights
Sukesh Mohan is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on advancing technologies that improve manufacturing processes and product quality.
Collaborations
He collaborates with notable colleagues, including Gary C Hsueh and Dimitris Lymberopoulos, contributing to innovative projects within the company.
Conclusion
Sukesh Mohan's contributions to semiconductor processing through his patented methods demonstrate his commitment to innovation and excellence in the field. His work continues to influence the efficiency and quality of semiconductor manufacturing processes.