Sukanya Datta

Title: Sukanya Datta: Innovator in Molybdenum Deposition Technologies

Introduction

Sukanya Datta is a prominent inventor based in Phoenix, AZ (US). She has made significant contributions to the field of material science, particularly in the area of molybdenum deposition technologies. Her innovative approaches have the potential to enhance various applications in semiconductor manufacturing.

Latest Patents

Sukanya Datta holds a patent for "Methods and assemblies for selectively depositing molybdenum." This patent describes methods for selectively depositing material comprising molybdenum on a first surface of a substrate relative to a second surface by employing a cyclic deposition process. The process involves providing a substrate in a reaction chamber and performing at least one super-cycle that includes a halide sub-cycle and an oxyhalide sub-cycle. The halide sub-cycle utilizes a molybdenum halide precursor, while the oxyhalide sub-cycle employs a molybdenum oxyhalide precursor along with a reactant to deposit molybdenum on the substrate. This innovative method has implications for the development of advanced semiconductor structures and devices.

Career Highlights

Sukanya Datta is associated with Asm IP Holding B.V., where she continues to push the boundaries of research and development in her field. Her work has garnered attention for its potential to improve the efficiency and effectiveness of material deposition processes.

Collaborations

Sukanya has collaborated with notable colleagues, including Chiyu Zhu and Jan Willem Maes. These partnerships have contributed to the advancement of her research and the successful implementation of her innovative ideas.

Conclusion

Sukanya Datta's contributions to the field of molybdenum deposition technologies exemplify her commitment to innovation and excellence. Her patent and ongoing work at Asm IP Holding B.V. highlight her role as a key player in advancing semiconductor manufacturing processes.