Macungie, PA, United States of America

Sui-Yuan Lynn


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 67(Granted Patents)


Company Filing History:


Years Active: 1992

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2 patents (USPTO):Explore Patents

Title: Sui-Yuan Lynn: Innovator in Polycrystalline Diamond Technology

Introduction

Sui-Yuan Lynn is a prominent inventor based in Macungie, PA (US). She has made significant contributions to the field of materials science, particularly in the development of polycrystalline diamond (PCD) technologies. With a total of 2 patents, her work has implications for various applications in the electronics industry.

Latest Patents

Lynn's latest patents include innovative methods for producing thick, adherent, and coherent polycrystalline diamond coatings. One of her notable inventions is the "Hot filament CVD of thick, adherent and coherent polycrystalline diamond." This patent describes a substrate product that consists of either a metallic or ceramic base, coated with multiple layers of PCD that exhibit a uniform microstructure and high electrical resistivity. The method allows for the deposition of PCD films with a thickness of at least 12 microns, suitable for both flat and curved substrates. These films are particularly effective in dissipating heat from radio frequency (RF) and microwave (MW) devices.

Another significant patent is the "Interrupted method for producing multilayered polycrystalline diamond." This method involves depositing PCD layers at specific temperatures, followed by a cool-down step before applying additional layers. Similar to her previous invention, this technique enables the creation of PCD films with a thickness of at least 12 microns, enhancing their utility in the electronics sector.

Career Highlights

Sui-Yuan Lynn is currently associated with Diamonex, Incorporated, where she continues to advance her research in diamond technologies. Her work has garnered attention for its innovative approaches to enhancing the performance of electronic components.

Collaborations

Throughout her career, Lynn has collaborated with notable colleagues, including Diwakar Garg and Robert L Iampietro. These partnerships have contributed to the successful development of her patented technologies.

Conclusion

Sui-Yuan Lynn's contributions to polycrystalline diamond technology exemplify her innovative spirit and dedication to advancing materials science. Her patents not only reflect her expertise but also hold promise for future applications in the electronics industry.

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