Sui Man Luk

Title: Sui Man Luk: Innovator in 3D Manufacturing Technology

Introduction

Sui Man Luk is a notable inventor based in Berkeley, CA, who has made significant contributions to the field of 3D manufacturing technology. With a focus on optimizing light intensity fields for the production of 3D objects, her work has the potential to revolutionize how complex geometries are created from various materials.

Latest Patents

Sui Man Luk holds a patent for a "Computed axial lithography optimization system." This innovative system is designed to determine a light intensity field that is essential for manufacturing a 3D object from a specified volume of material. The system utilizes a 3D specification that identifies voxels within the volume that will be part of the final object. By employing a cost function that models the energy dose each voxel receives during the manufacturing process, the system applies optimization techniques to generate effective light intensity fields. This advancement is crucial for enhancing the efficiency and accuracy of 3D manufacturing.

Career Highlights

Throughout her career, Sui Man Luk has worked with prestigious organizations, including Lawrence Livermore National Security, LLC and the University of California. Her experience in these institutions has allowed her to collaborate with leading experts in the field and contribute to groundbreaking research in 3D manufacturing technologies.

Collaborations

Sui Man Luk has collaborated with notable colleagues such as Maxim Shusteff and Kyle Champley. These partnerships have fostered an environment of innovation and have led to significant advancements in the technologies she has developed.

Conclusion

Sui Man Luk is a pioneering inventor whose work in 3D manufacturing technology is paving the way for future innovations. Her patented system for optimizing light intensity fields demonstrates her commitment to advancing the field and improving manufacturing processes.