Hong Kong, China

Sui Han Sin

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Ysl & C Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sui Han Sin. Retrieved from https://idiyas.com/inventor/sui-han-sin-1gh4y03t

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Sui Han Sin and Compostable Medical Mask Innovation.

Introduction

Sui Han Sin is an inventor associated with Hong Kong, CN, and Ysl & C Limited. His patent work includes a compostable medical face mask designed to combine filtration performance with compostable materials.

Latest Patents

The provided information lists 1 patent for Sui Han Sin: “Compostable Medical Face Mask.” The invention describes a mask with a printable outer non-woven layer, at least one intermediate filtration layer, and an inner non-woven layer that contacts the wearer. The layers use fibers of different diameters, including fine fibers in the intermediate filtration layer.

The mask is specified to achieve at least 98% bacterial, sub-micron particulate, and viral filtration efficiency. It is also designed to repel synthetic blood at 160 mm Hg and maintain a differential pressure below 5.0 mm HO/cm.

Career Highlights

The available details connect Sin’s patent activity with Ysl & C Limited and highlight his work on a compostable medical mask. The invention addresses filtration, splash resistance, and wearer comfort while using a layered non-woven construction.

Collaborations

The provided information names Siu Lung Yu and Yuyan Song as Sin’s coworkers. It does not specify their roles in the patent or describe the nature of their collaboration.

Conclusion

Sui Han Sin’s listed patent focuses on a compostable medical face mask that combines high filtration performance with splash resistance and a layered non-woven design.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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