Hiroshima, Japan

Suehiko Miura

This inventor holds 2 USPTO granted patents. Top assignee: Toda Kogyo Corporation. Active years: 2002-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Suehiko Miura. Retrieved from https://idiyas.com/inventor/suehiko-miura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 5.5

ph-index = 2

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2002-2004

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2 patents (USPTO):Explore Patents

Title: The Innovations of Suehiko Miura

Introduction

Suehiko Miura is a notable inventor based in Hiroshima, Japan. He has made significant contributions to the field of magnetic materials, particularly through his innovative patents. With a total of 2 patents, Miura has established himself as a key figure in his industry.

Latest Patents

Miura's latest patents include advancements in black magnetic iron oxide particles and magnetic toner. His work on "Black magnetic iron oxide particles for magnetic toner and process for producing the same" showcases his expertise in developing materials that enhance the performance of magnetic toners.

Career Highlights

Miura is currently employed at Toda Kogyo Corporation, where he continues to push the boundaries of innovation in magnetic materials. His role at the company allows him to apply his knowledge and skills to real-world applications, contributing to the advancement of technology in his field.

Collaborations

Miura has collaborated with talented coworkers such as Naoki Uchida and Hiromitsu Misawa. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Suehiko Miura's contributions to the field of magnetic materials through his patents and collaborations highlight his importance as an inventor. His work continues to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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