Jeonju, South Korea

Suck Jun Lee

This inventor holds 2 USPTO granted patents. Top assignee: Samsung Display Co., Ltd.. Active years: 2023-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Suck Jun Lee. Retrieved from https://idiyas.com/inventor/suck-jun-lee-3g0pqtgf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2023-2024

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2 patents (USPTO):Explore Patents

Title: Suck Jun Lee: Innovator in Display Technology

Introduction

Suck Jun Lee is a prominent inventor based in Jeonju-si, South Korea. He has made significant contributions to the field of display technology, particularly through his innovative patents. With a total of 2 patents, Lee continues to push the boundaries of what is possible in the industry.

Latest Patents

Lee's latest patents focus on an etching composition for thin films containing silver. This innovative etching composition includes an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water. These advancements are crucial for the development of efficient display devices.

Career Highlights

Suck Jun Lee is currently employed at Samsung Display Co., Ltd., where he applies his expertise in materials science and engineering. His work has been instrumental in enhancing the performance and reliability of display technologies.

Collaborations

Lee has collaborated with notable colleagues, including Jonghee Park and Hyoung Sik Kim. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Suck Jun Lee is a key figure in the advancement of display technology, with a focus on innovative etching compositions. His contributions continue to shape the future of the industry, making him a noteworthy inventor in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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