Company Filing History:
Years Active: 1989
Title: Subramanian Ramesh: Innovator in Silicon Technology
Introduction
Subramanian Ramesh is a notable inventor based in Ossining, NY (US). He has made significant contributions to the field of silicon technology, holding 2 patents that showcase his innovative approach to materials science.
Latest Patents
Ramesh's latest patents include a method of reduced stress recrystallization. This invention describes a process for producing a defect-free monocrystalline layer of silicon on an insulator. The method involves forming a thin layer of silicon dioxide on a monocrystalline silicon substrate, followed by a thin layer of polycrystalline or amorphous silicon. By focusing two beams from lamps on the thin silicon layer, a melt zone is created, surrounded by two narrow heated zones with a temperature differential of 2°C to 10°C/mm. This innovative technique allows for the scanning of the structure while heating the substrate to a temperature below that of the heated zones.
Another significant patent by Ramesh involves monocrystalline silicon layers on substrates. This invention provides a capped recrystallizable silicon layer covering a substrate, which is equipped with a thin buffer layer between the capping layer and the silicon layer. This process allows the recrystallizable silicon layer to be converted into a monocrystalline silicon layer, enhancing the quality and performance of silicon-based devices.
Career Highlights
Subramanian Ramesh is currently employed at North American Philips Corporation, where he continues to develop innovative solutions in silicon technology. His work has contributed to advancements in the field, making him a respected figure among his peers.
Collaborations
Ramesh collaborates with various professionals in his field, including his coworker Andre M Martinez. Their combined expertise fosters an environment of innovation and creativity, leading to groundbreaking developments in silicon technology.
Conclusion
Subramanian Ramesh is a prominent inventor whose work in silicon technology has led to significant advancements in the industry. His patents reflect a deep understanding of materials science and a commitment to innovation.