Su Wang

Title: Innovations by Inventor Su Wang in Shanghai, CN

Introduction

Su Wang is an accomplished inventor based in Shanghai, China, known for his significant contributions to the field of semiconductor materials and electroplating compositions. With a total of four patents to his name, Su has focused on developing innovative solutions that enhance the efficiency and effectiveness of cleaning agents and metal plating compositions.

Latest Patents

Su Wang's latest patents showcase his expertise in chemical compositions and their applications. One notable invention is a cleaning agent that efficiently removes nitrides from hard mask residues while maintaining minimal effects on metals and low-dielectric materials. This cleaning agent is formulated with specific mass fractions of an oxidant containing iodine, an etchant with boron, a pyrrolidinone solvent, a corrosion inhibitor, a metal ion-free surfactant, and water, resulting in a pH range of 7.5 to 13.5.

Another significant patent involves a leveling agent and a metal plating composition containing this agent. The formulation includes a metal plating solution consisting of a copper salt, an acidic electrolyte, halide ions, and a leveling agent. This composition is designed for use in printed circuit board electroplating and integrated circuit copper interconnection electroplating, achieving notable outcomes such as no defects, low impurity levels, and improved plating homogeneity.

Career Highlights

Throughout his career, Su Wang has worked with various organizations, notably with Shanghai Sinyang Semiconductor Materials Co., Ltd. His contributions have been influential in advancing the development of materials used in semiconductor manufacturing.

Collaborations

Su has collaborated with talented professionals in his field, including his coworkers Xianxian Yu and Li Ma. These collaborations have likely played a vital role in fostering innovative approaches to problem-solving and enhancing the effectiveness of research outcomes.

Conclusion

Su Wang's innovative spirit and commitment to excellence make him a prominent figure in the realm of semiconductor materials and electroplating solutions. His patents not only reflect his ingenuity but also contribute significantly to the industry, paving the way for future advancements in the field.