Taichung, Taiwan

Su-Chin Lee

This inventor holds 2 USPTO granted patents. Top assignee: Au Optronics Corporation. Active years: 2013-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Su-Chin Lee. Retrieved from https://idiyas.com/inventor/su-chin-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2013-2014

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2 patents (USPTO):Explore Patents

Title: Innovations by Su-Chin Lee

Introduction

Su-Chin Lee is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of color filter substrates, holding 2 patents that enhance the quality and uniformity of these materials. His work is particularly relevant in the display technology industry.

Latest Patents

One of Su-Chin Lee's latest patents is a color filter substrate with a black matrix on an undercut groove and the method of fabricating it. This innovative substrate includes a base layer with multiple grooves, where a black matrix layer is strategically placed between adjacent grooves. The black matrix extends above the groove edges, creating an undercut profile that improves the overall quality and color uniformity of the color filter substrate. This invention is crucial for enhancing the performance of display technologies.

Career Highlights

Su-Chin Lee is currently employed at AU Optronics Corporation, a leading company in the display technology sector. His work at AU Optronics has allowed him to focus on developing advanced materials that meet the growing demands of the industry.

Collaborations

Su-Chin Lee collaborates with Chun-Chieh Tsao, a talented woman in the field. Their partnership has led to innovative solutions and advancements in color filter technology.

Conclusion

Su-Chin Lee's contributions to the field of color filter substrates demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material science and its applications in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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