Francheville, France

Stéphane Dornier

This inventor holds 1 USPTO granted patent. Top assignee: Arkema France. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Stéphane Dornier. Retrieved from https://idiyas.com/inventor/stéphane-dornier

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: The Innovations of Stéphane Dornier

Introduction

Stéphane Dornier is a notable inventor based in Francheville, France. He has made significant contributions to the field of materials science, particularly in the development of innovative ink compositions.

Latest Patents

Stéphane Dornier holds a patent for an ink based on fluorinated polymer that boasts improved adhesion. This composition includes a PF polymer derived from vinylidene fluoride and a PA polymer that incorporates units from a (meth)acrylic monomer along with associative groups such as imidazolidonyl, triazolyl, triazinyl, bis-ureyl, and ureido-pyrimidyl groups. The ink is designed to be used in the production of electronic devices, showcasing its practical applications in modern technology.

Career Highlights

Stéphane Dornier is associated with Arkema France, a leading company in specialty chemicals and advanced materials. His work at Arkema has allowed him to focus on innovative solutions that meet the demands of various industries.

Collaborations

Throughout his career, Stéphane has collaborated with talented individuals such as Marie-France Delamotte and Manuel Hidalgo. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Stéphane Dornier's contributions to the field of materials science, particularly through his innovative ink composition, highlight his role as a significant inventor. His work continues to influence the production of electronic devices, demonstrating the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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