Elmira, NY, United States of America

Stuart L Saikkonen


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 34(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Stuart L. Saikkonen

Introduction

Stuart L. Saikkonen is a notable inventor based in Elmira, NY (US). He has made significant contributions to the field of optical technology, particularly in the area of optical waveguide fibers. His innovative approach has led to the development of a unique method and apparatus that enhances the performance of these fibers.

Latest Patents

Stuart L. Saikkonen holds a patent for a "Method and apparatus for recoating optical waveguide fibers." This invention features a split recoating mold designed for recoating optical waveguide fibers with a UV-curable resin. The mold, when closed, forms a cavity that matches the cross-sectional size and shape of the original fiber. It includes an injection port for introducing the UV-curable resin and means for introducing ultraviolet light into the cavity. This ensures that the resin cures effectively, even in areas far from the injection port. He has 1 patent to his name.

Career Highlights

Stuart L. Saikkonen has had a distinguished career at Corning Glass Works, where he has applied his expertise in optical technologies. His work has contributed to advancements in the manufacturing and performance of optical fibers, which are essential in various communication technologies.

Collaborations

Throughout his career, Stuart has collaborated with notable colleagues, including Lynn G. Amos and Donald R. Young. These partnerships have fostered innovation and have been instrumental in the development of new technologies in the optical field.

Conclusion

Stuart L. Saikkonen's contributions to the field of optical waveguide fibers exemplify the impact of innovative thinking in technology. His patent and work at Corning Glass Works highlight the importance of advancements in optical technology for future applications.

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