Burlingame, CA, United States of America

Stewart Sonnenfeldt

USPTO Granted Patents = 6 

Average Co-Inventor Count = 5.7

ph-index = 2

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 2010-2017

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6 patents (USPTO):Explore Patents

Title: Stewart Sonnenfeldt: Innovator in Epitaxial Lift Off Technology

Introduction

Stewart Sonnenfeldt is a notable inventor based in Burlingame, CA (US). He has made significant contributions to the field of epitaxial lift off (ELO) technology, holding a total of 6 patents. His work focuses on innovative methods and devices that enhance the efficiency and effectiveness of thin film applications.

Latest Patents

One of his latest patents is titled "Epitaxial lift off stack having a pre-curved handle and methods thereof." This invention relates to the formation of ELO thin films and outlines a method that includes depositing an epitaxial material over a sacrificial layer on a substrate. The process involves adhering a flattened, pre-curved support handle onto the epitaxial material and removing the sacrificial layer during an etching process. The etching process is designed to bend the pre-curved support handle, allowing for the peeling of the epitaxial material from the substrate while maintaining compression within the epitaxial material.

Career Highlights

Throughout his career, Stewart has worked with prominent companies such as Alta Devices, Inc. and Cisco Technology, Inc. His experience in these organizations has contributed to his expertise in the field of thin film technologies and epitaxial processes.

Collaborations

Stewart has collaborated with talented individuals in the industry, including Gang He and Gregg Higashi. These partnerships have likely enriched his work and led to further advancements in his inventions.

Conclusion

Stewart Sonnenfeldt is a distinguished inventor whose work in epitaxial lift off technology has made a significant impact in the field. His innovative methods and collaborations continue to push the boundaries of what is possible in thin film applications.

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