The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2015
Filed:
May. 29, 2009
Melissa Archer, Mountain View, CA (US);
Harry Atwater, South Pasadena, CA (US);
Thomas Gmitter, Sunnyvale, CA (US);
Gang He, Cupertino, CA (US);
Andreas Hegedus, Burlingame, CA (US);
Gregg Higashi, San Jose, CA (US);
Stewart Sonnenfeldt, Burlingame, CA (US);
Melissa Archer, Mountain View, CA (US);
Harry Atwater, South Pasadena, CA (US);
Thomas Gmitter, Sunnyvale, CA (US);
Gang He, Cupertino, CA (US);
Andreas Hegedus, Burlingame, CA (US);
Gregg Higashi, San Jose, CA (US);
Stewart Sonnenfeldt, Burlingame, CA (US);
Alta Devices, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the invention generally relate to epitaxial lift off (ELO) thin films and devices and methods used to form such films and devices. In one embodiment, a method for forming an ELO thin film is provided which includes depositing an epitaxial material over a sacrificial layer on a substrate, adhering a flattened, pre-curved support handle onto the epitaxial material, and removing the sacrificial layer during an etching process. The etching process includes bending the pre-curved support handle to have substantial curvature while peeling the epitaxial material from the substrate and forming an etch crevice therebetween. Compression is maintained within the epitaxial material during the etching process. The flattened, pre-curved support handle may be formed by flattening a pre-curved support material.