Corvallis, OR, United States of America

Steven P Storm


Average Co-Inventor Count = 6.3

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2003-2009

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Steven P. Storm

Introduction

Steven P. Storm is a notable inventor based in Corvallis, Oregon. He has made significant contributions to the field of technology, particularly in the development of methods for forming slotted substrates. With a total of 3 patents to his name, his work has had a considerable impact on various applications.

Latest Patents

Among his latest patents is a method of forming a slotted substrate with partially patterned layers. This innovative method involves patterning a thin film over a substrate, ensuring that a portion of the substrate within a slot region remains uncovered. The design minimizes the chip count in a shelf surrounding the slot, enhancing efficiency in manufacturing processes. Another significant patent is related to the thin film coating of a slotted substrate and techniques for forming slotted substrates. This patent describes a coated substrate for a center feed printhead, which includes a substrate and a thin film applied over it. The design aims to minimize crack formation and chip count, showcasing the versatility of thin films in various applications.

Career Highlights

Steven P. Storm is currently associated with Hewlett-Packard Development Company, L.P. His work at this esteemed organization has allowed him to further his research and development efforts in innovative technologies. His contributions have been instrumental in advancing the capabilities of printhead technology and substrate design.

Collaborations

Throughout his career, Steven has collaborated with several talented individuals, including Roberto A. Pugliese and Mark H. MacKenzie. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Steven P. Storm's innovative work in the field of technology, particularly in substrate design and thin film applications, has made a lasting impact. His patents reflect a commitment to advancing technology and improving manufacturing processes.

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