Steven McDermott

Title: Steven McDermott: Innovator in Lithographic Techniques

Introduction

Steven McDermott is a notable inventor based in Wynantskill, NY (US). He has made significant contributions to the field of lithography, particularly in the area of multiple patterning techniques. His innovative work has led to the development of methods that enhance the precision and efficiency of semiconductor manufacturing.

Latest Patents

Steven McDermott holds a patent for "Multiple patterning with lithographically-defined cuts - Methods of self-aligned multiple patterning." This patent describes a process where first and second mandrels are formed over a hardmask. A conformal spacer layer is deposited over the mandrels and the hardmask, followed by the patterning of a planarizing layer to create trenches that expose portions of the spacer layer. The etching process then removes specific portions of the spacer layer, allowing for the definition of a non-mandrel etch mask.

Career Highlights

Steven is currently employed at GlobalFoundries Inc., a leading semiconductor manufacturer. His work at the company focuses on advancing lithographic techniques that are crucial for the production of integrated circuits. His innovative approaches have contributed to the efficiency and effectiveness of semiconductor fabrication processes.

Collaborations

Throughout his career, Steven has collaborated with esteemed colleagues such as Ravi Prakash Srivastava and Hsueh-Chung Chen. These collaborations have fostered an environment of innovation and have led to significant advancements in their respective fields.

Conclusion

Steven McDermott is a prominent figure in the field of lithography, with a focus on multiple patterning techniques. His contributions through patents and collaborations have made a lasting impact on semiconductor manufacturing. His work continues to influence the industry and drive technological advancements.