Company Filing History:
Years Active: 2001-2002
Title: The Innovations of Steven E. Gianoulakis
Introduction
Steven E. Gianoulakis is a notable inventor based in Albuquerque, NM (US). He has made significant contributions to the field of extreme-UV lithography, holding a total of 5 patents. His work focuses on reducing thermal distortion in lithography reticles, which is crucial for improving the quality of semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Low thermal distortion extreme-UV lithography reticle." This invention addresses the issue of thermal distortion in reticles or masks by employing emissivity engineering. By selectively placing or omitting coatings on the reticle, the reflective reticles exhibit enhanced heat transfer. This innovation ultimately reduces thermal distortion and improves the transcription quality of the reticle pattern onto the wafer. The reflective reticles consist of a substrate with an active region defining the mask pattern and non-active regions characterized by a higher emissivity surface than the active region. The non-active regions are intentionally left uncoated with radiation reflective material.
Another significant patent is "Low thermal distortion Extreme-UV lithography reticle and method," which shares similar principles and aims to achieve the same improvements in thermal management and pattern transcription quality.
Career Highlights
Steven has worked with Euv LLC, where he applied his expertise in lithography technology. His innovative approaches have contributed to advancements in the semiconductor industry, particularly in the development of high-quality reticles.
Collaborations
Throughout his career, Steven has collaborated with notable professionals such as Avijit K. Ray-Chaudhuri and Robert W. Sparrow. These collaborations have further enriched his work and contributed to the success of his inventions.
Conclusion
Steven E. Gianoulakis is a prominent inventor whose work in extreme-UV lithography has led to significant advancements in the field. His innovative patents and collaborations highlight his commitment to improving semiconductor manufacturing processes.