Company Filing History:
Years Active: 1987-1988
Title: Steven A. Flessa: Innovator in X-ray Dispersive and Reflective Structures
Introduction
Steven A. Flessa is a notable inventor based in Southfield, MI (US). He has made significant contributions to the field of X-ray technology, particularly in the development of dispersive and reflective structures. With a total of two patents to his name, Flessa's work has advanced the capabilities of X-ray materials and their applications.
Latest Patents
Flessa's latest patents focus on X-ray dispersive and reflective structures. The first patent describes materials that exhibit at least one third of the theoretical integral reflection coefficient for the structures in the range of interest without fluorescence or absorption edges. These materials can be thermally activated to control desired properties during or post deposition. The structures can be deposited using ion beam absorption techniques, allowing for precise formation. Additionally, the index of refraction of these structures can vary continuously throughout.
The second patent further enhances the resolution and reflectivity of X-ray dispersive and reflective structures. It details the formation of these structures using metallic and non-metallic layer pairs, which can include a buffer layer to prevent interdiffusion and stabilize the structures. Similar to the first patent, these materials can also be thermally activated and deposited with precision.
Career Highlights
Flessa is associated with Ovonic Synthetic Materials Company Inc., where he continues to innovate in the field of X-ray technology. His work has been instrumental in pushing the boundaries of what is possible with X-ray materials.
Collaborations
Throughout his career, Flessa has collaborated with notable figures such as Stanford R. Ovshinsky and John E. Keem. These collaborations have contributed to the advancement of technology in his field.
Conclusion
Steven A. Flessa is a distinguished inventor whose work in X-ray dispersive and reflective structures has made a significant impact in the field. His innovative patents and collaborations highlight his commitment to advancing technology.