The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 1988
Filed:
Jun. 18, 1986
Stanford R Ovshinsky, Bloomfield Hills, MI (US);
John Keem, Bloomfield Hills, MI (US);
Steven A Flessa, Southfield, MI (US);
James L Wood, Westland, MI (US);
Keith L Hart, Flat Rock, MI (US);
Lennard Sztaba, Hamtramck, MI (US);
Ovonic Synthetic Materials Co., Inc., Troy, MI (US);
Abstract
X-ray dispersive and reflective structures and materials are provided which exhibit at least one third of the theoretical integral reflection coefficient for the structures in the range of interest without fluorescence or absorption edges. The materials can be thermally activated to control the desired properties, during or post deposition. The structures can be deposited by ion beam absorption techniques to form the structures in a precise manner. The index of the refraction of the structures can be continuously varying throughout the structures.