Saint Paul, MN, United States of America

Steven A Darmer

This inventor holds 1 USPTO granted patent. Top assignee: 3M Innovative Properties Company. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Steven A Darmer. Retrieved from https://idiyas.com/inventor/steven-a-darmer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2010

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Steven A. Darmer: Innovator in Contaminant Removal Technology

Introduction

Steven A. Darmer is a notable inventor based in Saint Paul, MN (US). He has made significant contributions to the field of adhesive technologies, particularly with his innovative approach to contaminant removal.

Latest Patents

Darmer holds a patent for a "Contaminant removal tape roll with sheet removal feature and method of manufacturing the same." This invention features a roll of contaminant removal tape that includes a backing layer, an adhesive layer, a plurality of lines of perforations, and discrete non-adhesive zones. The design allows for easy separation of the tape into sheets, enhancing its usability in various applications.

Career Highlights

Steven A. Darmer is associated with 3M Innovative Properties Company, where he has been instrumental in developing new adhesive solutions. His work has led to advancements in the efficiency and effectiveness of contaminant removal products.

Collaborations

One of his notable collaborators is John L. Thiele, with whom he has worked on various projects within the adhesive technology sector.

Conclusion

Steven A. Darmer's contributions to the field of contaminant removal technology exemplify innovation and practicality. His patent reflects a commitment to improving everyday products through thoughtful design and engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…