Company Filing History:
Years Active: 1985-1986
Title: Steve Buchholz: Innovator in Photomask Inspection Technology
Introduction
Steve Buchholz is a notable inventor based in San Jose, CA, who has made significant contributions to the field of photomask inspection technology. With a total of 2 patents, his work focuses on improving defect detection methods in photomasks, which are critical in the semiconductor manufacturing process.
Latest Patents
Buchholz's latest patents include a "Photomask inspection apparatus and method with improved defect detection" and an "Automatic system and method for inspecting hole quality." The first patent describes an apparatus designed for inspecting photomasks by comparing duplicate die patterns. This method utilizes two-dimensional pixel representations to identify defects through a defect detector circuit that analyzes points of non-agreement between the pixel representations. The system automatically adjusts the threshold error value based on the number and type of edges within the window matrices to enhance accuracy.
The second patent outlines an automatic inspection system for evaluating holes in a mask. This system incorporates various components, including carriage means, illumination means, optical means, and signal processing means. It measures the local radius of curvature, area, and diameter of holes to detect defects, ensuring high-quality standards in mask production.
Career Highlights
Steve Buchholz is currently employed at Kla Instruments Corporation, where he continues to innovate in the field of photomask inspection. His work has been instrumental in advancing the technology used in semiconductor manufacturing, contributing to the efficiency and reliability of the production process.
Collaborations
Buchholz has collaborated with notable colleagues, including William H Broadbent, Jr. and Mark Joseph Wihl, who have also contributed to advancements in the field.
Conclusion
Steve Buchholz's innovative work in photomask inspection technology has led to significant advancements in the semiconductor industry. His patents reflect a commitment to improving defect detection methods, ensuring high-quality standards in manufacturing processes.