Pleasanton, CA, United States of America

Sterling M Goyer

This inventor holds 1 USPTO granted patent. Top assignee: Lam Research Corporation. Active years: 2005.


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Sterling M Goyer

Introduction

Sterling M Goyer is a notable inventor based in Pleasanton, CA (US). He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent related to aluminum etching. His work is instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Sterling M Goyer holds a patent titled "Method of processing substrates." This invention pertains to a method of oxide hardmask aluminum etching in metal dry etch processors. The process consists of two main steps: first, dry etching an aluminum interconnect stack using an etch gas primarily composed of boron trichloride, chlorine, fluoroform, and nitrogen. The second step involves removing etch remnants through the use of vapor plasma. The etch gas is designed to etch the aluminum interconnection pattern in semiconductors, while the water vapor plasma serves to prevent chip corrosion during the removal of etch remnants. This innovative approach reduces the need for extensive water rinsing and solution cleaning, which is common in conventional practices.

Career Highlights

Sterling M Goyer is associated with Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to contribute to advancements in semiconductor manufacturing technologies. His expertise in etching processes has positioned him as a valuable asset in the field.

Collaborations

Some of Sterling's coworkers include Ann Chien and Brett C Richardson. Their collaboration within Lam Research Corporation has fostered an environment of innovation and technological advancement.

Conclusion

Sterling M Goyer's contributions to the field of semiconductor processing through his patent on aluminum etching demonstrate his commitment to innovation. His work not only enhances manufacturing efficiency but also sets a precedent for future advancements in the industry.

Profile summary based on public USPTO records.
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