Company Filing History:
11 out of 12 
1 out of 832,891 Years Active: 2003-2011
Title: Innovations of Stephen J Benner
Introduction
Stephen J Benner is a notable inventor based in Lansdale, PA (US), recognized for his contributions to the field of chemical mechanical planarization (CMP) systems. With a total of 12 patents to his name, he has made significant advancements in the technology used for polishing and conditioning surfaces in various applications.
Latest Patents
Among his latest patents is a system for measuring and controlling the level of vacuum applied to a conditioning holder within a CMP system. This innovative method and apparatus utilize an apertured conditioning disk to introduce operation-specific slurries without the need for additional tooling, platens, and materials handling. The system effectively pulls waste material out of the polishing pad through the conditioning disk, evacuating it through an outlet port. Additionally, it features a force adjustment system that allows for precise measurement and control of the force applied by the conditioning disk to the polishing pad. Another significant patent is the cleaning cup system for CMP apparatus, which improves the cleaning process of abrasive conditioning disks and conditioner heads. This invention includes an underside water knife that directs a high-velocity stream of cleaning fluid against the rotating abrasive disk, along with spray stems that ensure thorough cleaning of all exposed portions of the conditioner head.
Career Highlights
Stephen has worked with Tbw Industries Inc., where he applied his expertise in developing innovative solutions for CMP systems. His work has significantly impacted the efficiency and effectiveness of surface conditioning processes.
Collaborations
Throughout his career, Stephen has collaborated with notable individuals such as Robert L Benner and Yuzhuo Li, contributing to advancements in the field through shared knowledge and expertise.
Conclusion
Stephen J Benner's innovative patents and career achievements highlight his significant role in advancing CMP technology. His work continues to influence the industry, showcasing the importance of innovation in engineering and technology.