Stephen Grannemann

Title: Inventor Spotlight: Stephen Grannemann

Introduction

Stephen Grannemann is an innovative inventor based in Rolla, Missouri, known for his contributions to the field of microelectronics. With a focus on advancing lithographic technologies, he holds a patent that addresses critical challenges in the production of microelectronics structures.

Latest Patents

Grannemann's patent, titled "Adhesion layers for EUV lithography," introduces new lithographic compositions designed for use as EUV (Extreme Ultraviolet) adhesion layers. This invention outlines methods for fabricating microelectronic structures that utilize these compositions. The procedural approach involves applying an adhesion layer directly below the photoresist layer, which may be placed onto the substrate or any intermediate layers, such as alpha-carbon and metal hardmask. The preferred adhesion layers utilize spin-coatable, polymeric compositions, ultimately improving adhesion and mitigating pattern collapse issues.

Career Highlights

Currently, Stephen Grannemann is employed at Brewer Science, Inc., a company recognized for its advancements in materials science and innovation within the semiconductor industry. His role has significantly contributed to the enhancement of methodologies and techniques used in microelectronics fabrication.

Collaborations

Grannemann collaborates with talented colleagues including Andrea M. Chacko and Vandana Krishnamurthy. Together, they work towards pushing the boundaries of existing technologies and fostering advancements in the field.

Conclusion

Stephen Grannemann’s inventive work in developing adhesion layers for EUV lithography represents a significant step forward in microelectronics fabrication. His dedication to innovation and collaboration drives the industry forward, contributing to more efficient and effective technologies.