Stephanie Oyola-Reynoso

Title: The Innovative Contributions of Stephanie Oyola-Reynoso

Introduction

Stephanie Oyola-Reynoso is an accomplished inventor based in Albany, NY, recognized for her expertise and contributions to the field of materials science. With a significant focus on the development of advanced etching methods, she has secured a patent that showcases her innovative capabilities.

Latest Patents

Stephanie holds a patent for a "Method for highly anisotropic etching of titanium oxide spacer using selective top-deposition." This invention outlines methods for forming spacers on a patterned substrate using a self-aligned multiple patterning (SAMP) process. Specifically, her approach involves a novel etching technique for titanium oxide (TiO) spacers, characterized by highly anisotropic etching and selective top deposition. The use of an inductively coupled plasma (ICP) etch tool enables this one-step etching process, incorporating a protective layer to minimize etching rate discrepancies and protect the mandrel.

Career Highlights

Currently, Stephanie is associated with Tokyo Electron Limited, where she continues to push the boundaries of innovation within the semiconductor industry. Her skills and expertise have positioned her as a key contributor to various projects involving advanced semiconductor technology.

Collaborations

Throughout her career, Stephanie has collaborated with several notable colleagues, including Ya-Ming Chen and Katie Lutker-Lee. Their collective efforts illustrate a commitment to fostering innovation and achieving breakthroughs in their respective fields.

Conclusion

With a strong foundation in technology and a passion for innovation, Stephanie Oyola-Reynoso exemplifies the spirit of creativity in the world of patents. Her contributions, particularly in the area of etching processes, not only advance her career but also enhance the capabilities of the semiconductor industry as a whole.