Grenoble, France

Stephanie Anderbouhr

This inventor holds 1 USPTO granted patent. Top assignee: Commissariat a L'energie Atomique Et Aux Energies Alternatives. Active years: 2000.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Stephanie Anderbouhr: Innovator in Chemical Vapor Deposition

Introduction

Stephanie Anderbouhr is a notable inventor based in Grenoble, France. She has made significant contributions to the field of chemical vapor deposition (CVD). Her innovative work focuses on the preparation of multilayer coatings that enhance the durability and performance of various substrates.

Latest Patents

Stephanie holds a patent for a process that involves the preparation of a multilayer coating. This process utilizes chemical vapor deposition to create a stack of layers, including titanium nitride (TiN) and titanium-aluminum nitride ((Ti,Al)N). The entire coating is produced in a single, continuous operation, allowing for precise adjustments in the composition of each layer. This invention is particularly applicable to wear-resistant coatings that can withstand high temperatures and resist oxidation and corrosion.

Career Highlights

Stephanie is affiliated with the Commissariat à l'Énergie Atomique, where she has been instrumental in advancing research in material science. Her work has garnered attention for its practical applications in various industries, particularly those requiring high-performance coatings.

Collaborations

Stephanie has collaborated with esteemed colleagues, including Frederic Schuster and Elisabeth Blanquet. Their combined expertise has contributed to the success of her innovative projects.

Conclusion

Stephanie Anderbouhr is a pioneering inventor whose work in chemical vapor deposition has the potential to revolutionize the field of material coatings. Her contributions are vital for developing advanced materials that meet the demands of modern technology.

Profile summary based on public USPTO records.
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