Company Filing History:
1 out of 47 
1 out of 972 
Years Active: 2000-2002
Title: Innovations of Inventor Stephan Beckx
Introduction
Stephan Beckx is a notable inventor based in Leuven, Belgium. He has made significant contributions to the field of microelectronics, particularly in the development of advanced fabrication methods for field-effect transistors (FETs). With a total of 2 patents, his work showcases innovative approaches to semiconductor technology.
Latest Patents
One of his latest patents is titled "Method for forming a FET having L-shaped insulating spacers." This patent discloses a scalable device concept and a fabrication method that allows for minimal well-controlled gate overlap. By utilizing low resistivity source/drain extension regions with shallow junctions, the gate overlap becomes independent of the junction depth of the source/drain contact regions. The use of L-shaped spacers helps to locally reduce the penetration depth of the source/drain implantation in the substrate. This method is particularly beneficial for FETs with a channel length below 0.25 µm, as it broadens the process window of the silicidation process of the source/drain contact regions while limiting the thermal budget required for the extension regions.
Another significant patent by Beckx is the "Method for forming a spacer." This method involves the formation of spacers in a single dry etch sequence within a single dry etch tool. The process includes defining polysilicon spacers, using them as an etch mask, and subsequently removing them. The etch sequence comprises at least one dry etching step, and if multiple steps are involved, they are performed consecutively without breaking the vacuum in the etch tool. This innovative approach demonstrates the capability of using a single dry etch sequence for the formation of nitride spacers, showcasing efficiency in semiconductor manufacturing.
Career Highlights
Stephan Beckx has worked with prominent organizations in the field of microelectronics, including the Interuniversitair Microelektronica Centrum (imec) and Imec Vzw. His experience in these institutions has allowed him to contribute to cutting-edge research and development in semiconductor technologies.
Collaborations
Throughout his career, Beckx has collaborated with notable colleagues such as Serge Vanhaelemeersch and Goncal Badenes. These collaborations have further enriched his work and contributed to advancements in the field.
Conclusion
Stephan Beckx is a distinguished inventor whose innovative patents and contributions