This inventor holds 1 USPTO granted patent. Top assignee: Crytur, Spol. S.r.o.. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Štepán Novotný: Innovator in Light Source Technology
Introduction
Štepán Novotný is a notable inventor based in Bakov nad Jizerou, Czech Republic. He has made significant contributions to the field of light source technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of light sources using advanced materials.
Latest Patents
Štepán Novotný holds a patent for a light source that utilizes a light-converting material. This invention is designed for the conversion of collimated or focused light. Unlike traditional methods that rely solely on geometric concentration, Novotný's design reflects light away from the interface between the conversion body and its surroundings. This is achieved through the high refractive index of the conversion body, potentially enhanced by an applied reflective layer. The light source is capable of emitting collimated or focused intense secondary light, or a homogenized mix of primary and secondary light, and may also transmit supplementary light.
Career Highlights
Throughout his career, Štepán Novotný has been associated with Crytur, Spol. S.r.o., where he has further developed his expertise in light technology. His innovative approach has positioned him as a key figure in the advancement of lighting solutions.
Collaborations
Štepán has collaborated with talented individuals such as Jan Kubát and Martin Pokorný, contributing to the development of cutting-edge technologies in the field.
Conclusion
Štepán Novotný's contributions to light source technology exemplify the spirit of innovation. His patent reflects a deep understanding of material properties and their applications in modern lighting solutions. His work continues to influence the industry and inspire future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile