De Pinte, Belgium

Stefan Vansteenkiste

This inventor holds 1 USPTO granted patent. Top assignee: Agfa Gevaert Nv. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Stefan Vansteenkiste. Retrieved from https://idiyas.com/inventor/stefan-vansteenkiste

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Stefan Vansteenkiste

Introduction

Stefan Vansteenkiste is a notable inventor based in De Pinte, Belgium. He has made significant contributions to the field of lithographic printing technology. His innovative approach has led to the development of a unique method for producing lithographic plates.

Latest Patents

Stefan holds a patent for a "Method for producing lithographic plates with imaging elements." This invention outlines a process that includes exposing a photosensitive imaging element and developing it through a series of steps. The method emphasizes the use of a hydrophobic photosensitive layer that incorporates specific non-ionic photosensitive precursors. This advancement enhances the efficiency and quality of lithographic printing.

Career Highlights

Stefan is currently associated with Agfa Gevaert NV, a company renowned for its expertise in imaging technology. His work at Agfa Gevaert has allowed him to apply his innovative ideas in a practical setting, contributing to the company's reputation in the industry.

Collaborations

Stefan has collaborated with several talented individuals, including Marc Irene Van Damme and Joan T Vermeersch. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Stefan Vansteenkiste's contributions to lithographic printing technology exemplify the impact of innovation in the field. His patent and work at Agfa Gevaert NV highlight his commitment to advancing imaging technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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