DE

Stefan Huehn

This inventor holds 0 USPTO granted patents, plus 1 CIPO patent.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Stefan Huehn. Retrieved from https://idiyas.com/inventor/stefan-huehn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

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Title: The Innovative Contributions of Stefan Huehn

Introduction

Stefan Huehn is a notable inventor based in Germany, recognized for his innovative approach to applying flowable materials. His work primarily focuses on enhancing the efficiency and effectiveness of material application processes.

Latest Patents

Stefan Huehn has developed a significant patent titled "Method And Device For Applying A Flowable Material Across A Surface." This invention relates to a method and device for applying a flowable material, particularly a particulate material, in individual superimposed layers across a support. The flowable material is initially filled from a stationary feed station into a storage container of an application device. The application device travels back and forth across the support, distributing the flowable material inside the storage container across its entire length. It then meters the material through a slot into a metering shaft, ensuring that the filling level in the metering shaft remains constant during the application process.

Career Highlights

Stefan Huehn is currently employed at Prometal Rct Gmbh, where he continues to contribute to advancements in material application technologies. His innovative methods have the potential to streamline various industrial processes.

Collaborations

Stefan collaborates with talented individuals such as Rainer Hoechsmann and Martin Stachulla, who share his commitment to innovation and excellence in their respective fields.

Conclusion

Stefan Huehn's contributions to the field of material application demonstrate his dedication to innovation and efficiency. His work continues to influence the industry positively, paving the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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