This inventor holds 2 USPTO granted patents. Top assignee: Solvay & Cie (Societe Anonyme). Active years: 1991-1992.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1991-1992
Title: Stefaan Magnus: Innovator in Chemical Polishing Technologies
Introduction
Stefaan Magnus is a notable inventor based in Halle, Belgium. He has made significant contributions to the field of chemical polishing, particularly for copper and copper alloys. With a total of 2 patents, his work has advanced the methods used in various industrial applications.
Latest Patents
Magnus's latest patents include innovative solutions for chemical polishing. The first patent, titled "Baths and process for chemical polishing of copper or copper alloy," describes baths that utilize an aqueous solution containing hydrogen peroxide, phosphoric acid, and tetraborate ions. This invention aims to enhance the efficiency and effectiveness of polishing copper surfaces. The second patent, "Copper etching bath and method of using," outlines a similar approach but incorporates chloride ions and adjusts the pH to between 1.25 and 3, ensuring optimal conditions for chemical polishing.
Career Highlights
Stefaan Magnus is currently employed at Solvay & Cie, a prominent company known for its innovative chemical solutions. His work at Solvay has allowed him to focus on developing advanced chemical processes that benefit various industries. Magnus's expertise in chemical polishing has positioned him as a key player in this specialized field.
Collaborations
One of his notable collaborators is Daniel Tytgat, with whom he has worked closely on various projects related to chemical polishing technologies. Their combined efforts have led to advancements that enhance the quality and efficiency of copper processing.
Conclusion
Stefaan Magnus's contributions to the field of chemical polishing demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of chemical processes and their applications in industry. Through his work at Solvay & Cie, he continues to push the boundaries of what is possible in chemical polishing technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile