Midland, MI, United States of America

Stanley Yee

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignees: Dow Silicones Corporation, University of Michigan. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Stanley Yee. Retrieved from https://idiyas.com/inventor/stanley-yee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Stanley Yee - Innovator in 3D Pattern Formation

Introduction

Stanley Yee is an inventor based in Midland, MI (US). He has worked with notable organizations such as Dow Silicones Corporation and the University of Michigan. Although he currently holds no granted patents, his contributions to the field of innovation are noteworthy.

Latest Patent Applications

Stanley Yee's latest patent applications include a method of forming a three-dimensional (3D) pattern or article. This method involves selecting a first composition to be printed with a nozzle of an apparatus, identifying desired characteristics of a pattern or layer, and determining dimensional differences between desired and predicted characteristics based on computational simulation modeling. The process also includes printing the first composition on a substrate to form the pattern or layer while implementing a correction signal to adjust the flow rate of the composition. Another application is for a static mixer, which comprises a housing defining an internal mixing cavity adapted for axial flow of a fluid. The static mixer features a mixing element free from an impingement surface and includes a heat-exchanging jacket integrally formed with the housing.

Conclusion

Stanley Yee's innovative approaches in 3D pattern formation and static mixing demonstrate his commitment to advancing technology, even in the absence of granted patents.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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