Stanley Liu

Title: Innovations by Stanley Liu in RF Technology

Introduction

Stanley Liu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of radio frequency (RF) technology, particularly in the area of plasma processing. His innovative approach has led to advancements that enhance the efficiency of RF power application in various industrial processes.

Latest Patents

Stanley Liu holds a patent for a "Method and system for autotuning of RF match." This invention addresses the challenges associated with chamber impedance changes during processing. The patent discloses a reactive correction mechanism that operates automatically and repeatedly, eliminating the need to alter the process recipe. By controlling RF power application to a plasma processing chamber, Liu's invention minimizes reflected power and ensures efficient RF power application to the plasma. The autotuning process can be implemented without modifying a qualified process recipe, utilizing frequency matching and RF matching network tuning.

Career Highlights

Stanley Liu is currently employed at Advanced Micro-Fabrication Equipment, Inc. Asia, where he continues to develop innovative solutions in the field of micro-fabrication. His work has been instrumental in advancing technologies that support various applications in semiconductor manufacturing and other industries.

Collaborations

Stanley Liu collaborates with talented professionals in his field, including coworkers James Yang and Zhaohui Xi. Their combined expertise contributes to the ongoing development of cutting-edge technologies in RF applications.

Conclusion

Stanley Liu's contributions to RF technology through his innovative patent demonstrate his commitment to enhancing industrial processes. His work continues to influence the field and drive advancements in micro-fabrication technologies.