Stanley A Ficner

Title: Innovations and Contributions of Stanley A Ficner

Introduction

Stanley A Ficner is a notable inventor based in Bethlehem, PA (US). He has made significant contributions to the field of photolithography, holding a total of 3 patents. His work focuses on developing advanced materials and methods that enhance the efficiency and effectiveness of photoresist technologies.

Latest Patents

One of his latest patents is titled "Antireflective composition for a deep ultraviolet photoresist." This invention relates to a novel antireflecting coating composition that comprises a polymer, thermal acid generator, and a solvent composition. The composition is designed to strongly absorb radiation ranging from about 130 nm to about 250 nm, making it particularly useful in photolithography processes. Another significant patent is "Method of developing positive photoresist and compositions therefor." This patent illustrates a method and composition for developing positive photoresists, which includes an ammonium hydroxide aqueous base and a surfactant of the fluorinated alkyl alkoxylate class. The preferred surfactant includes sulfonyl and amine moieties, present in an optimal amount of 10 to 30 ppm.

Career Highlights

Throughout his career, Stanley has worked with prominent companies such as Clariant Finance (BVI) Limited and Hoechst Celanese Corporation. His experience in these organizations has contributed to his expertise in the field of materials science and photolithography.

Collaborations

Stanley has collaborated with notable professionals in his field, including Munirathna Padmanaban and Ralph R Dammel. These collaborations have further enriched his work and innovations.

Conclusion

Stanley A Ficner's contributions to the field of photolithography through his patents and collaborations highlight his role as an influential inventor. His innovative approaches continue to impact the industry positively.