Clariant Finance (bvi) Limited

Hoechst Celanese Corporation

Stanley A Ficner

Wayne Martin Moreau

Ralph R Dammel

Munirathna Padmanaban

Ping-Hung Lu

Joseph E Oberlander

Walter Spiess

Christopher F Lyons

Anthony Canize

John P Sagan

Marina V Plat

John Magvas

The present invention relates to a novel antireflecting coating composition, where the composition comprises a polymer, thermal acid generator and a solvent composition. The invention further comprises processes for the use of such a composition in photolithography. The composition strongly absorbs radiation ranging from about 130 nm (nanometer) to about 250 nm.

Antireflective composition for a deep ultraviolet photoresist

A method and composition for developing positive photoresists is illustrated. The developer of the present invention includes an ammonium hydroxide aqueous base and a surfactant of the fluorinated alkyl alkoxylate class most preferably present in an amount of from 10 to 30 ppm. A particularly preferred surfactant includes sulfonyl and amine moieties.

Method of developing positive photoresist and compositions therefor

A photosensitizer comprising a trishydroxyphenylethane 80/20 to 50/50 2,1,5-/2,1,4-diazonaphthoquinone sulfonate, and a trishydroxybenzophenone 0/100 to 20/80 2,1,5-/2,1,4-diazonaphthoquinone sulfate, and a photoresist composition containing such photosensitizer, the photosensitizer being present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; and a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition.

Positive photoresist composition comprising a mixed ester of

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Bethlehem, PA, United States of America

Stanley A Ficner