NEW YORK, NY, United States of America

Stanislav Bychkovsky

This inventor holds 1 USPTO granted patent. Top assignee: Warby Parker Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Stanislav Bychkovsky. Retrieved from https://idiyas.com/inventor/stanislav-bychkovsky

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Stanislav Bychkovsky: Inventor in Virtual Try-On Technology.

Introduction

Stanislav Bychkovsky is an inventor associated with Warby Parker Inc. and based in New York, NY, United States. His patent work addresses digital spectacle removal and virtual try-on, combining image processing with augmented-image display.

Latest Patents

Bychkovsky is credited with 1 patent: “Systems, Non-Transitory Computer Readable Mediums, and Methods for Spectacle Removal and Virtual Try-On.” The invention describes a computing device that captures an image, identifies and segments locations corresponding to an object, and uses likelihood estimates to determine which areas to inpaint. It then generates an augmented image by superimposing a selected object, such as eyewear, and displays the result through the device’s user interface.

Career Highlights

The patent reflects work on computer-vision techniques for virtual eyewear experiences. Its approach combines object detection, image segmentation, inpainting, and augmented-image generation to support spectacle removal and virtual try-on.

Collaborations

Bychkovsky is associated with Warby Parker Inc. His listed coworkers include Viktoria Pashkovskaya and Patrick Stock.

Conclusion

Stanislav Bychkovsky’s patent focuses on image-processing methods that enable spectacle removal and virtual try-on, connecting technical innovation with Warby Parker’s eyewear business.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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