This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2004.
Company Filing History:
Years Active: 2004
Title: Innovations by Stacey J Winter: A Leader in Photolithography
Stacey J Winter, located in Alameda, CA, is an accomplished inventor known for his contributions to the field of photolithography. With one patent to his name, Winter demonstrates a commitment to advancing technological capabilities within the industry.
Latest Patents
Winter's notable patent is titled "Technique for writing with a raster scanned beam." This innovative technique involves generating patterns using a raster scanned beam in a photolithographic system that employs a multiple blank position flash cycle. In one embodiment of this invention, the beam creates a shadow of a first aperture, which impinges upon a region of a stop, known as the first blank position. The beam is then deflected, moving the shadow of the first aperture along a first direction to a flash position, where a portion of the shadow superimposes a second aperture situated in the stop. To finalize the flash cycle, the beam is further deflected so that the shadow of the first aperture targets a second region of the stop, referred to as the second blank position. This innovative method allows the beam to efficiently impinge upon two different blank positions during the flash cycle, significantly enhancing the speed and precision of photolithographic processes.
Career Highlights
Stacey J Winter's career is marked by his association with Applied Materials, Inc., a leading company in the semiconductor and display industries. His work and expertise have contributed to the development of cutting-edge technologies that facilitate advancements in manufacturing techniques.
Collaborations
Throughout his journey, Winter has collaborated with esteemed colleagues such as Lee H Veneklasen and Stephen A Rishton. These partnerships underscore the importance of teamwork in driving innovations and pushing the boundaries of what is possible in the field of technology.
Conclusion
Stacey J Winter stands out as an influential figure in the realm of photolithography with his patented technique that optimizes the use of raster scanned beams. His contributions demonstrate not only his ingenuity but also a dedication to advancing technology in a collaborative environment. As he continues his work at Applied Materials, Inc., Winter's innovations are likely to pave the way for future developments in the industry.