Sreenivas Kosaraju

Title: Sreenivas Kosaraju: Innovator in Dielectric Diffusion Barriers

Introduction

Sreenivas Kosaraju is a prominent inventor based in Portland, OR (US). He has made significant contributions to the field of dielectric materials, holding a total of 11 patents. His work focuses on developing advanced materials that enhance the performance of electronic devices.

Latest Patents

One of Sreenivas Kosaraju's latest patents is titled "Conformal Low Temperature Hermetic Dielectric Diffusion Barriers." This innovation involves the creation of conformal hermetic dielectric films that serve as dielectric diffusion barriers over three-dimensional topography. The dielectric diffusion barrier includes a dielectric layer, such as a metal oxide, which can be deposited using atomic layer deposition (ALD) techniques. This method achieves greater conformality and density compared to conventional silicon dioxide-based films deposited by a plasma-enhanced chemical vapor deposition (PECVD) process. The invention also explores multi-layered films that incorporate high-k and low-k dielectric layers to reduce the dielectric constant, enhancing the overall performance of the diffusion barrier.

Career Highlights

Sreenivas Kosaraju is currently employed at Intel Corporation, where he continues to push the boundaries of innovation in dielectric materials. His expertise and research have positioned him as a key figure in the development of advanced electronic components.

Collaborations

Some of his notable coworkers include Sean W King and Hui Jae Yoo, who collaborate with him on various projects within the field of dielectric materials.

Conclusion

Sreenivas Kosaraju's contributions to the field of dielectric diffusion barriers exemplify his commitment to innovation and excellence. His work at Intel Corporation and his numerous patents highlight his role as a leading inventor in the industry.