Kawasaki, Japan

Souichirou Hidaka

This inventor holds 4 USPTO granted patents. Top assignees: Fujitsu Corporation, Fujitsu Hitachi Plasma Display Limited. Active years: 1999-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Souichirou Hidaka. Retrieved from https://idiyas.com/inventor/souichirou-hidaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 1999-2008

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4 patents (USPTO):Explore Patents

Title: Souichirou Hidaka: Innovator in Gas Discharge Panel Technology

Introduction

Souichirou Hidaka is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of gas discharge panel technology, holding a total of 4 patents. His innovative work has paved the way for advancements in display technologies.

Latest Patents

Hidaka's latest patents include a gas discharge panel production method. This invention provides a gas discharge panel that features at least a protective film containing a driving voltage-reducing compound. Another notable patent is for a gas discharge panel that also incorporates a protective film with a driving voltage-reducing compound. These inventions highlight his focus on improving the efficiency and performance of gas discharge panels.

Career Highlights

Throughout his career, Souichirou Hidaka has worked with prominent companies such as Fujitsu Corporation and Fujitsu Hitachi Plasma Display Limited. His experience in these organizations has contributed to his expertise in the development of advanced display technologies.

Collaborations

Hidaka has collaborated with several talented individuals in his field, including Tadayoshi Kosaka and Hiroyuki Nakahara. These collaborations have further enriched his work and innovation in gas discharge panel technology.

Conclusion

Souichirou Hidaka's contributions to gas discharge panel technology demonstrate his commitment to innovation and excellence. His patents and career achievements reflect his significant impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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