Company Filing History:
Years Active: 2021
Title: Sotaro Ishibashi: Innovator in Semiconductor Technology
Introduction
Sotaro Ishibashi is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of film formation methods and apparatuses.
Latest Patents
Ishibashi holds a patent for a film formation method and a vacuum processing apparatus. This invention includes methods for manufacturing semiconductor light-emitting elements and semiconductor electronic elements. The patent describes a process that allows for the fabrication of an epitaxial film with +c polarity using a sputtering method. The method involves heating a substrate to a predetermined temperature and forming a semiconductor thin film with a wurtzite structure.
Career Highlights
Sotaro Ishibashi is associated with Canon Anelva Corporation, where he has been instrumental in advancing semiconductor technologies. His work has focused on improving the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Ishibashi has collaborated with notable colleagues, including Yoshiaki Daigo and Takuya Seino. Their combined expertise has contributed to the development of innovative solutions in the semiconductor industry.
Conclusion
Sotaro Ishibashi's contributions to semiconductor technology through his patent and work at Canon Anelva Corporation highlight his role as a key innovator in the field. His advancements in film formation methods continue to influence the industry.