Chiba, Japan

Sotaro Ban

This inventor holds 1 USPTO granted patent. Top assignee: Dai Nippon Printing Co., Ltd.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sotaro Ban. Retrieved from https://idiyas.com/inventor/sotaro-ban

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Sotaro Ban

Introduction

Sotaro Ban is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of structural repair and reinforcement. His innovative approach has led to the development of a unique method that enhances the durability and longevity of various structures.

Latest Patents

Sotaro Ban holds a patent for a method of repairing or reinforcing a target structure. This method involves preparing an adhesive sheet that contains at least an adhesive layer and a repairing or reinforcing material. The adhesive sheet is then irradiated with ionizing radiation before being attached to the target structure. This innovative technique offers a new solution for structural integrity.

Career Highlights

Sotaro Ban is currently employed at Dai Nippon Printing Co., Ltd. His work at this esteemed company has allowed him to explore and develop his inventive ideas further. With a focus on practical applications, he has successfully translated his concepts into tangible solutions.

Collaborations

Sotaro has collaborated with talented coworkers, including Kentaro Hoshi and Kazuki Tsukiyama. Their combined expertise has contributed to the advancement of their projects and innovations.

Conclusion

Sotaro Ban's contributions to the field of structural repair through his patented method demonstrate his innovative spirit and dedication to improving technology. His work continues to inspire advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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