Suwon, South Korea

Soonhong Charles Hwang

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Soonhong Charles Hwang. Retrieved from https://idiyas.com/inventor/soonhong-charles-hwang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Soonhong Charles Hwang - Innovator in Optical Measurement Technology

Introduction

Soonhong Charles Hwang is an inventor based in Suwon-si, South Korea. He is known for his innovative work in the field of optical measurement technology. Although he currently holds no granted patents, his contributions to the field are noteworthy.

Latest Patent Applications

Hwang's latest patent application is titled "OPTICAL MEASUREMENT APPARATUS AND OPTICAL MEASUREMENT METHOD." This application describes an optical measurement apparatus that includes a first light emitter designed to emit a first light on a surface of a sample. It also features a second light emitter that emits a second light on the same surface where the first light is focused. The apparatus includes a physical property detector that obtains physical property information of the sample by detecting changes in the amount of light from the second light due to the photothermal effect of the first light. Additionally, it has at least one structure detector that gathers structural information by detecting reflected light from the first and second light.

Conclusion

Soonhong Charles Hwang's work in optical measurement technology showcases his innovative spirit and dedication to advancing the field. His latest patent application reflects his commitment to developing new methods and apparatuses that enhance our understanding of physical properties and structures.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…