Hwaseong, South Korea

Soon-mok Ha

This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2019-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Soon-mok Ha. Retrieved from https://idiyas.com/inventor/soon-mok-ha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2019-2020

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3 patents (USPTO):Explore Patents

Title: Innovations of Soon-mok Ha

Introduction

Soon-mok Ha is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology. With a total of 3 patents to his name, his work has had a considerable impact on the industry.

Latest Patents

His latest patents include a micro-pattern forming method, a capacitor and method of manufacturing the same, and a semiconductor device and method of manufacturing the same. The micro-pattern forming method involves forming a mold layer and a supporting material layer on a substrate, patterning these layers to create recess patterns, and forming conductor patterns within these recesses. The process also includes removing a portion of the supporting material layer to allow the conductor patterns to protrude, forming a block copolymer layer, and selectively removing parts of this layer to expose the mold layer.

Career Highlights

Soon-mok Ha is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and develop new technologies. His work is crucial in advancing semiconductor manufacturing processes.

Collaborations

He has collaborated with notable coworkers, including Jae-hee Kim and Chan Soo Hwang, contributing to various projects and innovations within the company.

Conclusion

Soon-mok Ha's contributions to semiconductor technology and his innovative patents highlight his role as a key figure in the industry. His work continues to influence advancements in micro-patterning and semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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