Company Filing History:
Years Active: 2003-2004
Title: Innovations by Inventor Soon K Yuh
Introduction
Soon K Yuh is an accomplished inventor based in Scotts Valley, CA (US). He holds 2 patents that showcase his expertise in atmospheric pressure wafer processing and chemical vapor deposition systems. His innovative contributions have significantly advanced the field of semiconductor manufacturing.
Latest Patents
One of his notable patents is the "Atmospheric pressure wafer processing reactor having an internal pressure control system and method." This invention provides an atmospheric pressure wafer processing system that delivers at least one gas, featuring an exhaust control feedback system. This system utilizes sensors to measure the pressure within the system and adjusts control units to maintain the desired set pressures. The sensors specifically measure small differential pressures inside a muffle, allowing for a more stable pressure balance during wafer processing. This innovation is particularly beneficial for chemical vapor deposition applications, yielding improved process repeatability over extended runtimes.
Another significant patent is the "Protective gas shield apparatus." This invention is a gas shield assembly designed to protect an exposed surface of an injector in a chemical vapor deposition system. The assembly includes a back wall that supports perforated sheets to define a plenum, ensuring a uniform flow of gas into the system. This design enhances the efficiency and effectiveness of the chemical vapor deposition process.
Career Highlights
Throughout his career, Soon K Yuh has worked with notable companies such as Aviza Technology Limited and ASML US, Inc. His experience in these organizations has contributed to his development as a leading inventor in his field.
Collaborations
He has collaborated with esteemed colleagues, including Lawrence Duane Bartholomew and Robert J Bailey, further enriching his professional journey and innovation efforts.
Conclusion
Soon K Yuh's contributions to the field of semiconductor manufacturing through his patents demonstrate his commitment to innovation and excellence. His work continues to influence advancements in technology and industry practices.