This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Semisysco Co., Ltd.. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Innovations by Soon-Jong Lee
Introduction
Soon-Jong Lee is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of glass substrate measurement technology. His innovative approach has led to the development of a unique system that enhances the accuracy of measuring irregularities in glass substrates.
Latest Patents
Soon-Jong Lee holds a patent for a "System and method of measuring irregularity of a glass substrate." This invention utilizes reflection light from both the upper and lower surfaces of the glass substrate to measure irregularities effectively. The system comprises a light source section that outputs a first light to the glass substrate and a screen. The first light is reflected by the surfaces of the glass substrate, allowing for the formation of lines on the screen that correspond to the reflection light. This method provides a reliable means of assessing the quality of glass substrates.
Career Highlights
Soon-Jong Lee is associated with Semisysco Co., Ltd., where he continues to innovate in the field of optical measurement technologies. His work has been instrumental in advancing the capabilities of glass substrate analysis, which is crucial for various applications in electronics and optics.
Collaborations
He has collaborated with notable colleagues such as Bong-Joo Woo and Seong-Jin Choi, contributing to the development of cutting-edge technologies in their field.
Conclusion
Soon-Jong Lee's contributions to the measurement of glass substrates exemplify the importance of innovation in technology. His patent reflects a significant advancement in the industry, showcasing his expertise and commitment to improving measurement techniques.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile