This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2005
Title: Innovations of Sook-Hyun Park
Introduction
Sook-Hyun Park is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of substrate analysis through his innovative inventions. His work is particularly recognized in the realm of electronics and materials science.
Latest Patents
Sook-Hyun Park holds a patent for an "Apparatus for analyzing a substrate employing a copper decoration." This apparatus includes a bath with at least two receiving containers for electrolytes. It features slots for receiving substrates in a direction normal to the bottom face of the bath. The design incorporates lower copper plates that contact the entire rear faces of the substrates, along with upper copper plates that are separated from the front faces. A power source is connected to both sets of copper plates to provide necessary voltages. This innovative apparatus allows for the simultaneous analysis of multiple substrates, significantly reducing the time required for analysis. He has 1 patent to his name.
Career Highlights
Sook-Hyun Park is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His role involves developing advanced technologies that enhance the efficiency of substrate analysis. His contributions have been instrumental in improving the performance of electronic devices.
Collaborations
Throughout his career, Sook-Hyun Park has collaborated with talented individuals such as Kyoo-Chul Cho and Gi-Jung Kim. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in their field.
Conclusion
Sook-Hyun Park's work exemplifies the spirit of innovation in the electronics industry. His patented apparatus for substrate analysis showcases his commitment to advancing technology and improving efficiency. His contributions continue to impact the field positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
