Daejeon, South Korea

Soo Wan Kim

This inventor holds 1 USPTO granted patent. Top assignee: Hannanotech Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Soo Wan Kim. Retrieved from https://idiyas.com/inventor/soo-wan-kim-u4moo1e2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Soo Wan Kim

Introduction

Soo Wan Kim is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of polymer compositions, particularly focusing on materials that exhibit excellent weather and impact resistance.

Latest Patents

Soo Wan Kim holds a patent for a matting polymer composition that boasts exceptional weather resistance and impact resistance. The patent describes a matting polymer composition that includes two types of styrene-acrylonitrile copolymers with varying acrylonitrile contents, along with a matting agent. This innovative composition allows for molded articles produced through extrusion or injection processes to possess superior mechanical properties, effective matting effects, and high-quality appearance.

Career Highlights

Soo Wan Kim is currently associated with Hannanotech Co., Ltd., where he continues to develop advanced materials. His work has been instrumental in enhancing the performance characteristics of polymer products, making them more durable and visually appealing.

Collaborations

Soo Wan Kim has collaborated with colleagues such as Doo Han Ha and Sung Wook Ha, contributing to the advancement of their shared projects and innovations.

Conclusion

Soo Wan Kim's contributions to polymer technology highlight his role as a key innovator in the field. His patent for a matting polymer composition demonstrates his commitment to developing materials that meet high standards of performance and quality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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