Soo Ryong Lee

Title: Innovations of Soo Ryong Lee

Introduction

Soo Ryong Lee is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of optical proximity correction, which is crucial in the manufacturing of semiconductor devices. His innovative methods have the potential to enhance the precision and efficiency of lithography processes.

Latest Patents

Soo Ryong Lee holds a patent for an "Optical proximity correction method and method of fabricating mask including the same." This patent involves a sophisticated process that includes extracting first patterns from a pattern mask, performing lithography on at least a part of the first patterns to form first-first patterns, and subsequently correcting the pattern mask on which the first-first patterns are formed. This method is essential for improving the accuracy of patterning in semiconductor fabrication.

Career Highlights

Soo Ryong Lee is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung has allowed him to be at the forefront of technological advancements in the semiconductor industry. His expertise in optical proximity correction has positioned him as a valuable asset to his team and the company.

Collaborations

Soo Ryong Lee collaborates with talented individuals such as Soo Yong Lee and Seo Rim Moon, who contribute to the innovative environment at Samsung. Their combined efforts in research and development have led to advancements in semiconductor technologies.

Conclusion

Soo Ryong Lee's contributions to optical proximity correction and his role at Samsung Electronics Co., Ltd. highlight his importance in the field of semiconductor innovation. His patent and collaborative efforts reflect a commitment to advancing technology and improving manufacturing processes.