Soo-Hyun Kim

Title: Innovations of Soo-Hyun Kim

Introduction

Soo-Hyun Kim is an accomplished inventor based in Suseong-gu, South Korea. He has made significant contributions to the field of thin film technology, particularly through his innovative methods for forming ruthenium thin films. His work is characterized by a focus on precision and efficiency in material deposition processes.

Latest Patents

Soo-Hyun Kim holds a patent for a "Method for forming ruthenium thin film." This invention relates to a technique for creating a ruthenium thin film using a specific ruthenium precursor, tricarbonyl (η-methylene-1,3-propanediyl) ruthenium ((CO)Ru-TMM). The method involves atomic layer deposition at temperatures ranging from 200° C. to 350° C., utilizing a reaction gas that may include oxygen, hydrogen, water, and ammonia. This innovative approach enhances the quality and performance of ruthenium thin films in various applications.

Career Highlights

Throughout his career, Soo-Hyun Kim has worked with notable organizations, including the Research Cooperation Foundation of Yeungnam University and Tanaka Kikinzoku Kogyo Co., Ltd. His experience in these institutions has allowed him to refine his expertise in thin film technologies and contribute to advancements in the field.

Collaborations

Soo-Hyun Kim has collaborated with various professionals, including his coworker, Yohei Kotsugi. Their joint efforts have furthered research and development in thin film applications, showcasing the importance of teamwork in innovation.

Conclusion

Soo-Hyun Kim's contributions to the field of thin film technology, particularly through his patented methods, highlight his role as a significant inventor. His work continues to influence advancements in material science and engineering.